High Pressure Plasma Applications
Measurement of CH and CH3 Radicals in Dielectric Barrier Discharge Using Photofragmentation Laser-Induced Fluorescence
5:15 pm – 5:30 pmNon-thermal plasma technology is a novel approach for converting methane (CH4) to produce H2 or syngas for carbon neutrality. In the CH4 reforming process, it is essential to investigate the dynamics of methylidyne (CH) and methyl (CH3), the primary radicals produced in the CH4 cracking process, to achieve an deeper understanding of CH4 decomposition process. Here, we report the dynamic behavior of CH and CH3 radicals in a dielectric barrier discharge (DBD) with argon (Ar) and nitrogen (N2) dilutions. The Photofragmentation Planar Laser-Induced Fluorescence (PF-PLIF) imaging technique provided time evolution and spatial distribution of CH and CH3 radicals produced by electric discharge in DBD. The PF-PLIF results revealed that both radicals exhibited higher concentrations and more extensive spatial distributions in Ar than in N2. These results contribute to the development of efficient plasma technologies for sustainable energy applications.
Funding acknowledgement
King Abdullah University of Science and Technology (BAS/1/1384-01-01); Kungliga Fysiografiska Sällskapet i Lund; Vetenskapsrådet (2021-04506); HORIZON EUROPE European Research Council (852394, LAPLAS); H2020 Energy (884229, HYFLEXPOWER); Horizon 2020 Framework Programme (871124, LASERLAB-EUROPE).
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