Modeling & Simulation VII
Numerical moddeling of the ionospferic plasma by means of the stochastic approach
3:00 pm – 3:15 pmPhysical processes in the ionosphere are still a topical subject of research. Of particular interest is the process of ionospheric modification by the action of a powerful wave. Strong interaction of a powerful heating wave with the ionospheric plasma in the F-layer usually leads to parametric instability, which occurs at the Langmuir resonance point near the reflection point of the pump wave. Parametric instability of the plasma leads to effective excitation of electron and ion plasma waves and the formation of a region of Langmuir turbulence. Nonlinear processes of Langmuir turbulence lead to the formation of cavitons (long-lived caverns of plasma density) disturbances in the distribution of the average plasma concentration.
In this report, a stochastic approach is constructed that takes into account the diffusion mechanisms of electron motion and Landau damping effects. A modification of the stochastic approach is given that takes into account collisions of electrons with neutral particles. In this paper, it is proposed to apply an approach based on Kramers' theory of overcoming the potential barrier. It is shown that this approach is in good agreement with the existing estimates obtained within the framework of Sagdeev's quasilinear model. Arguments are given in favor of the adequacy of this approach.
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- 2:30 pm – 3:00 pmScaling of ultraviolet photon formation in low pressure plasmas: implications for microelectronics and sterilisation processes
Andrew R Gibson (presenter), Michel Osca Engelbrecht, Theo Carpenter, Lars Schücke, Angie Natalia Torres Segura, Jonathan Jenderny, Henrik Hylla, Dominik Filla, Nikita Bibinov, Ihor Korolov, Peter Awakowicz, Christopher P Ridgers
- 3:00 pm – 3:15 pmNumerical moddeling of the ionospferic plasma by means of the stochastic approach
Nurken E Aktaev (presenter), Anatoly A Kudryavtsev, Chengxun Yuan
- 3:15 pm – 3:30 pmDesign and optimization of a microwave plasma enhanced chemical vapor deposition system for low-pressure operations
Kaviya Aranganadin (presenter), Hua-Yi Hsu, Ming-Chieh Lin