Modeling & Simulation I
9:00 am – 10:30 am,
Tuesday October 14 Session IT1 COEX, Room E6
Hybrid Particle In Cell Monte Carlo simulations of extreme ultraviolet-induced beam line discharge
10:15 am – 10:30 amPresenter: Efe Kemaneci (ASML)
Authors: Dmitry Astakhov (ISTEQ), Jacqueline van Veldhoven (TNO), Aneta Stodolna (TNO), Arnold Storm (TNO), Luuk Heijmans (ASML), Andrei Yakunin (ASML), Mark van de Kerkhof (ASML)
The properties of hydrogen plasma in Extreme Ultra Violet (EUV) lithography machines impact various physical phenomena, including material degradation and particle behavior. To assess material durability and robustness under plasma conditions, multiple tests are conducted in EUV-beam-line 2 (EBL2). A thorough characterization of the EBL2 plasma setup is crucial for understanding the plasma influence on sensitive components. The setup is modeled using a 3D Hybrid-Particle-In-Cell-Kinetic-Monte-Carlo method, and the simulation results are compared with available measurements, revealing transient plasma behavior.
Funding acknowledgement
This work is funded by ASML.
PRESENTATIONS (5)
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Derek Kuldinow (presenter), Kentaro Hara
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- 10:00 am – 10:15 amKinetic Plasma Simulation Capabilities in the MOOSE Framework: Verification of Particle-Particle Collisions
Grayson Gall (presenter), Logan Harbour, Casey T Icenhour, Pierre-Clémont Simon, Amanda M Lietz
- 10:15 am – 10:30 amHybrid Particle In Cell Monte Carlo simulations of extreme ultraviolet-induced beam line discharge
Efe Kemaneci (presenter), Dmitry Astakhov, Jacqueline van Veldhoven, Aneta Stodolna, Arnold Storm, Luuk Heijmans, Andrei M Yakunin, Mark van de Kerkhof