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Poster Session II

4:30 pm – 6:30 pm, Wednesday October 15 Session DW5 COEX, Lobby E
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Plasma Uniformity Control via DC Anode Spots in Ion Beam Etching System with Inductively Coupled Plasma Source

Poster 10
Presenter: Jung-min Park (Korea University, Sejong Campus)
Authors: Chang-su Kim (Korea University, Sejong Campus), Yun Hwan Kim (Seoul National University)

In ion beam etching systems that generate ribbon ion beams through elongated slit apertures, plasma density tends to decrease near the slit ends, potentially leading to non-uniform beam profiles. To address this, we installed a pair of tungsten electrodes at both edges of the extraction aperture and applied DC voltage to create two localized anode spots. These anode spots enhanced plasma density in regions where the main inductively coupled plasma was deficient, resulting in improved plasma uniformity near the extraction zone. Two-dimensional optical emission spectroscopy tomography confirmed increased local emission intensity and improved density flatness across a range of pressure conditions. This method offers a compact and energy-efficient approach to plasma shaping and is expected to contribute to better beam uniformity in future ion beam etching operations.

Funding acknowledgement

This work was supported by the High-Quality Resources for Public-Private Joint Investment Semiconductors funded by Ministry of Trade, Industry and Energy (RS-2024-00405103).

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