Capacitively Coupled Plasmas II
9:00 am – 10:30 am,
Thursday October 16 Session GR1 COEX, Room E5
Electron dynamics and particle transport in capacitively coupled Ar/O2 discharges driven by sawtooth up voltage waveform
9:15 am – 9:30 amPresenter: Wan Dong (Dalian University of Technology)
Authors: Zhuo-Yao Gao (Dalian University of Technology), Li Wang (Ruhr University Bochum), Ming-Jian Zhang (Dalian University of Technology), Chong-Biao Tian (Dalian University of Technology), Yong-Xin Liu (Dalian University of Technology), Yuan-Hong Song (Dalian University of Technology), Julian Schulze (Ruhr University Bochum)
One dimensional fluid/electron Monte Carlo simulations of capacitively coupled Ar/O2 discharges driven by sawtooth voltage waveforms are performed as a function of the number of consecutive harmonics driving frequencies of 13.56 MHz, N, pressure and gas mixture. The effects of these external parameters on the electron dynamics, and the transport of ions and neutrals are revealed. The combination of a decrease in the mean free path of electrons and the presence of the Electrical Asymmetry Effect result in different distributions of the ionization rate, which lead to a reduction in the amplitude of the DC self-bias at higher pressures. As the admixture of electronegative O2 increases, the electronegativity is enhanced, and the discharge mode changes from an α – Drift Ambipolar (DA) hybrid to DA mode. This work focuses on linking these fundamental changes of the plasma physics induced by changing external parameters to process relevant particle fluxes to the electrodes. Particular attention is paid to O(1D) flux, because it is a precursor of deposition. In discharges driven by sawtooth up voltage waveforms, placing the substrate on the grounded electrode and increasing the number of consecutive harmonics, N, can facilitate the deposition process, since the O(1D) flux to the substrate is higher in these scenarios. Moreover, at an O2 admixture of 20%, the O(1D) flux is nearly as high as that at an O2 admixture of 90%, indicating that a higher O(1D) flux can be achieved without excessively increasing the O2 admixture.
Funding acknowledgement
This work was supported by the National Natural Science Foundation of China under Grant Nos. 12020101005, 12347131, 12475202, 12405289, the Liaoning Provincial Natural Science Foundation Joint Fund under Grant Nos. 2023-BSBA-089, the China Scholarship Council (No. 202306060179), the Fundamental Research Funds for the Central Universities under Grant Nos. DUT24BS069, and the German Research Foundation via the SFB 1316 (project A4) as well as grant 428942393.
PRESENTATIONS (6)
- 9:00 am – 9:15 amDifferent methods for improving uniformity of very high frequency capacitively coupled discharges
Denis Eremin (presenter), Yulia Sharova, Liang Xu, Masaaki Matsukuma, Thomas Mussenbrock, Ralf Peter Brinkmann
- 9:15 am – 9:30 amElectron dynamics and particle transport in capacitively coupled Ar/O2 discharges driven by sawtooth up voltage waveform
Wan Dong (presenter), Zhuo-Yao Gao, Li Wang, Ming-Jian Zhang, Chong-Biao Tian, Yong-Xin Liu, Yuan-Hong Song, Julian Schulze
- 9:30 am – 9:45 amSimulation benchmarks of the PIC-MCC codes XPDP1 and VSim for helium capacitively coupled plasma discharges with spatiotemporal analysis
Kaviya Aranganadin (presenter), Guo-Ning Wang, Hua-Yi Hsu, John P. Verboncoeur, Ming-Chieh Lin
- 9:45 am – 10:00 amOn electron power absorption in low pressure electronegative capacitive discharges
Jon Gudmundsson (presenter)
- 10:00 am – 10:15 amScaling of Capacitively Coupled Plasmas Properties up to 10s of kV Driving Voltages
Andrew Tasman Powis (presenter), Sarveshwar Sharma, Alexander V. Khrabrov, Igor D Kaganovich
- 10:15 am – 10:30 amIon energy distribution transitions from multimodal to quasi-single-peak in capacitive discharges driven by tailored voltage waveforms
Deqi Wen (presenter), Chan Feng, Jon Gudmundsson, John P. Verboncoeur, Julian Schulze, You-Nian Wang