Capacitively Coupled Plasmas II
9:00 am – 10:30 am,
Thursday October 16 Session GR1 COEX, Room E5
Ion energy distribution transitions from multimodal to quasi-single-peak in capacitive discharges driven by tailored voltage waveforms
10:15 am – 10:30 amPresenter: Deqi Wen (Dalian University of Technology)
Authors: Chan Feng (Dalian University of Technology), Jon Gudmundsson (University of Iceland), John P. Verboncoeur (Michigan State University), Julian Schulze (Chair of Applied Electrodynamics and Plasma Technology, Ruhr University Bochum, Bochum, Germany), You-Nian Wang (Dalian University of Technology)
The ion energy distribution (IED) bombarding the electrodes plays an important role in capacitively coupled argon discharges that are applied in plasma etching. In this work, we employed a fully kinetic particle-in-cell Monte Carlo collision model to investigate the ion energy distributions (IED) in low pressure (~10mTorr) capacitive argon discharge with one electrode driven by a high frequency voltage source (60 MHz) and the other electrode driven by a low-frequency composed tailored voltage waveform. It is found that the IEDs exhibid a transition from a multimodal to quasi-single-peak profile while increasing the amplitude of the low frequency tailored voltage waveform and keeping the high frequency voltage amplitude a constant. This is because the DC bias exhibits an apparent change from a positive to negative value when the tailored waveform amplitude increases. The secondary electron emission from the surface also significantly influences the ion/electron energy distribution and a detailed analysis of the dynamics of the oscillating sheath field will be discussed.
Funding acknowledgement
This work was partially supported by the Fundamental Research Funds for the Central University (Grant No.DUT24RC(3)115) and the Air Force Office of Scientific Research (AFOSR) MURI Grant FA9550-21-1-0367 and NSF-DOE Partnership Grant for DE-SC0022078, the Icelandic Research Fund Grant Nos.163086 and 217999.
PRESENTATIONS (6)
- 9:00 am – 9:15 amDifferent methods for improving uniformity of very high frequency capacitively coupled discharges
Denis Eremin (presenter), Yulia Sharova, Liang Xu, Masaaki Matsukuma, Thomas Mussenbrock, Ralf Peter Brinkmann
- 9:15 am – 9:30 amElectron dynamics and particle transport in capacitively coupled Ar/O2 discharges driven by sawtooth up voltage waveform
Wan Dong (presenter), Zhuo-Yao Gao, Li Wang, Ming-Jian Zhang, Chong-Biao Tian, Yong-Xin Liu, Yuan-Hong Song, Julian Schulze
- 9:30 am – 9:45 amSimulation benchmarks of the PIC-MCC codes XPDP1 and VSim for helium capacitively coupled plasma discharges with spatiotemporal analysis
Kaviya Aranganadin (presenter), Guo-Ning Wang, Hua-Yi Hsu, John P. Verboncoeur, Ming-Chieh Lin
- 9:45 am – 10:00 amOn electron power absorption in low pressure electronegative capacitive discharges
Jon Gudmundsson (presenter)
- 10:00 am – 10:15 amScaling of Capacitively Coupled Plasmas Properties up to 10s of kV Driving Voltages
Andrew Tasman Powis (presenter), Sarveshwar Sharma, Alexander V. Khrabrov, Igor D Kaganovich
- 10:15 am – 10:30 amIon energy distribution transitions from multimodal to quasi-single-peak in capacitive discharges driven by tailored voltage waveforms
Deqi Wen (presenter), Chan Feng, Jon Gudmundsson, John P. Verboncoeur, Julian Schulze, You-Nian Wang