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Poster Session I

4:30 pm – 6:30 pm, Tuesday October 14 Session DT4 COEX, Lobby E
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Development of a Microwave-Based Patch Antenna Sensor for Measuring Plasma Uniformit

Poster 37
Presenter: Gwang-Seok Chae (Korea Aerospace University)
Authors: Hee-Jung Yeom (Korea Research Institute of Standards and Science), Min Young Yoon (Korea Aerospace University), Eun-Seok Choe (Korea Research Institute of Standards and Science), Jung Hyung Kim (Korea Research Institute of Standards and Science), Hyo-Chang Lee (Korea Aerospace University)

Accurate and real-time measurement of electron density is critical for advancing semiconductor and display plasma processes in both current and next-generation technologies, as it directly impacts wafer quality and overall production yield. While microwave-based diagnostic techniques—such as the flat cutoff sensor—have been investigated, these typically necessitate a continuous coaxial structure or feature sensor bodies several millimeters thick, which limits their applicability. To address these constraints, we developed a Patch-Type Cutoff Sensor capable of transmitting microwaves and measuring plasma properties without relying on a coaxial configuration. The sensor's structure was refined using electromagnetic wave simulations, which also verified its accuracy across a range of plasma conditions. Furthermore, experimental validation confirmed the sensor's ability to probe bulk plasma characteristics. The effectiveness of this sensor in predicting wafer processing outcomes was further demonstrated by correlating its diagnostic outputs with actual etching results, underscoring its utility as a practical and compact diagnostic solution for semiconductor and display fabrication environments.

Funding acknowledgement

This research was supported by the Technology Innovation Program, funded by the Ministry of Trade, Industry & Energy(MOTIE, Korea) (grant nos. RS-2024-00507767,00508070,2410000200, 2410000258, 2410003567); Ministry of Science and ICT and the R&D Convergence Program of the National Research Foundation (NRF) of Korea (grant no. CRC20015-000) ; Korea Semiconductor Research Consortium (KSRC) (grant nos. 00235950, 00237058); Korea Research Institute of Standards and Science (grant no. KRISS GP2025-0013-02); 2023 Korea Aerospace University Faculty Research (grant no. 202300250001)

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