Poster Session I
4:30 pm – 6:30 pm,
Tuesday October 14 Session DT4 COEX, Lobby E
Comparison of sheath thickness measurement methods using cutoff probe
Poster 39Presenter: JinHyeok jang (Chungnam National University)
Collaboration: Sijun Kim; Laboratoire de Physique des Plasma (LPP)<br>Chulhee Cho, Inho Seong, Wonnyoung Jeong, Minsu Choi, Byeongyeop Choi, Woobeen Lee, Seonghyun Seo, Isak Lee, Wongyuna Park; Chungnam National University (CNU)<br>Shinjae You*
The cutoff probe is commonly used for electron density diagnostics, and various methods have also been developed to apply it for sheath thickness estimation. However, the accuracy and applicable regimes of each method have not yet been fully verified. in this study, we compare two methods of estimating sheath thickness using a cutoff probe under various plasma conditions. The results from each method were compared with theoretical values based on the Child–Langmuir law. Through this comparison, we identified the method that more accurately reflects the theoretical sheath model. This work provides insight into selecting effective approaches for sheath diagnostics using cutoff probes.
POSTERS (97)
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- Poster 92Dynamic Three-Wave Coupling between Local Sporadic Spokes and Emergence of Global Breathing Oscillation in Partially Magnetized Cross-Field Plasmas
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- Poster 96Spatially Resolved Endpoint Detection of Silicon Dioxide Etching in CF₄/O₂/Ar Plasma via Multi-Channel Optical Emission Spectroscopy
Sanghee Han (presenter), Jaehyeon Kim, Eunchong Park, Minseong Kim, Heeyeop Chae
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